Ticket #2707 (closed: duplicate)
Separate Mask from Workspace
| Reported by: | Mathieu Doucet | Owned by: | Nick Draper |
|---|---|---|---|
| Priority: | major | Milestone: | Iteration 30 |
| Component: | Mantid | Keywords: | |
| Cc: | Blocked By: | ||
| Blocking: | Tester: | Michael Reuter |
Description
What: Create masks in a separate "mask" workspace and keep it separately from the data workspace. We'll probably need to add a MaskWorkspace property to the Workspace2D to hook-in utility methods to verify whether a pixel is masked.
Why: It would make user interaction with the reduction software much easier and efficient. Think about a widget to set your mask. You would like to be able to display the data, apply your mask, then _modify_ the mask. You want to do this without reloading or copying the data (there is no way to unmask the masked pixels, which are zeroed out in addition to be flagged). Saving the mask separately would also enable a user to set up and reuse a mask with different workspaces without having to copy over the masked pixels (a slow process).
Change History
comment:2 Changed 9 years ago by Nick Draper
- Milestone changed from Iteration 29 to Iteration 30
"New" tickets moved at the code freeze of iteration 29
comment:3 Changed 9 years ago by Nick Draper
- Status changed from new to verify
- Owner set to Nick Draper
- Resolution set to duplicate
Done in a previous iteration.
comment:4 Changed 9 years ago by Michael Reuter
- Status changed from verify to verifying
- Tester set to Michael Reuter
Bulk move of tickets at the end of iteration 28